图 9  (a), (b) 位于石墨烯边缘的Ni原子的STM图像[61]; (c) 未经氧处理的石墨烯边缘示意图; (d) 对H附着的能量进行的密度泛函理论计算(density functional theory, DFT)[62]; (e) 氧处理的石墨烯边缘示意图; (f) 局部供氧法示意图; (g) 氧未参与反应的CH4分解过程; (h) 反应能量分布示意图; (i) 氧参与反应的CH4分解过程[63]

Fig. 9.  (a), (b) STM images of the Ni adatoms at the graphene edges[61]; (c)−(e) schematic illustration of graphene edges (e) with and (c) without oxygen and (d) the corresponding DFT calculations of the energies for H attachment[62]; (f) schematic illustration of the growth of WTe2 film by local-oxygen-feeding method; (g)−(i) the energy profiles of the reaction of CH4 decomposition (i) with and (g) without oxygen supply on Cu surface and (h) the corresponding DFT calculations of the energy dispersion[63].