本文介绍了用于催化Pt涂层生产的磁控溅射技术的发展。通过单步磁控溅射以不同方式制备低Pt负载的气体扩散电极。Pt和Pt碳膜（95-97 wt％Pt）直接沉积在气体扩散层（GDL）上：碳纸（Sigracet®39 BC）和碳布（GDL-CT，ELAT®LT 1400 W）。使用脉冲频率为100 kHz的双极脉冲直流（DC）磁控管溅射作为催化剂沉积的方法。薄膜中的总Pt负载在0.04-0.13 mg * cm -2的范围内变化。通过扫描/透射电子显微镜（S / TEM），X射线吸收近边缘结构（XANES）和电位动力学方法研究了在GDL上获得的催化剂。沉积的催化剂具有高的电化学表面积（ECSA），并通过耐久性应力测试（DST）方法确定了稳定性。在脉冲（100 kHz）溅射模式下使用Pt靶可获得最高的ECSA。该ECSA值在3000次应力测试循环中相当稳定，而通过多元醇法在相同的气体扩散层上沉积的Pt的循环为500个循环。

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This article presents development of magnetron sputtering technology for catalytic Pt coating production. Low Pt-loaded gas diffusion electrodes were prepared by a single-step magnetron sputtering in different regimes. Pt and Pt-carbon films (95–97 wt% Pt) were deposited directly onto the gas diffusion layers (GDLs): carbon paper (Sigracet® 39 BC) and carbon cloths (GDL-CT, ELAT® LT 1400 W). A bipolar pulsed direct current (DC) magnetron sputtering with pulsed frequency 100 kHz was used as the method for catalysts deposition. Total Pt loading in the thin films varied in the range 0.04–0.13 mg*cm−2. Obtained catalysts onto GDLs were investigated by scanning/transmission electron microscope (S/TEM), X-ray Absorption Near Edge Structure (XANES) and potentiodynamic methods. The deposited catalysts had a high electrochemical surface area (ECSA) and stability determined by the durability stress test (DST) method. The highest ECSA was obtained with Pt target in the pulsed (100 kHz) sputtering mode. This ECSA values were rather stable during 3000 cycles of stress-tests versus 500 cycles for Pt deposited by polyol method on the same gas diffusion layers.